Me, Myself, and A.I.: Should Kenya’s Patent Law Be Amended to Recognise Machine Learning Systems as Inventors?. Strathmore Law Review, [S. l.], v. 8, n. 1, p. 73–102, 2023. DOI: 10.52907/slr.v8i1.235. Disponível em: https://journals.strathmore.edu/lawreview/article/view/235. Acesso em: 28 aug. 2026.